I agree that photogrammetry and procedural generation do not need to compete.
The goal for me would be to be able to create mile long cave systems that have interesting organic rock-like sharp features, if they are based on photogrammetry elements or noise or a mixture is fine.
My current solution is to build a lowpoly mesh "hand made", up-res it with the "remesh" SOP, innhert the UV's from the hand made lowpoly, have a Z-brush displacment map, and make a falloff attribute for the UV-seams, and make the texture displacment falloff close to UV-seams and replace it with Noise along the UV seams.
This approach work very well, because I can then use a Diffuse and Normalmap that "syncs" up very nicely with the displacment map.
The bad part with that solution is the ridiculous amount of polygons it generates and that the polyreduce SOP is single threaded and destroys the UV's, so I have to "re project them" from the original mesh with a attribute transfer SOP which does it works sorta of semi bad because of the big polygons going over the uv-seams in the original mesh. I tried the UV-Relax SOP on Orbolt that solve that issue to a degree, but messes up some other parts of the UV even more terrible, and for some reason I cant put that SOP in a Foreach.
But in the end, very close to a good result but not crossed the finishline.